Introduction

The Wafer Metrology group is part of ASML’s Development & Engineering organization, within the Performance & Integration cluster. The group is responsible for developing a robust metrology ecosystem that enables accurate performance assessment and optimization of ASML’s lithography systems. This ecosystem includes state-of-the-art hardware platforms—such as Critical Dimension Scanning Electron Microscopes (CD-SEM) and optical metrology tools—as well as advanced software solutions for image processing, contour extraction, and KPI evaluation.

CD-SEM is a cornerstone technology in semiconductor manufacturing and is widely used across both Research & Development (R&D) and High Volume Manufacturing (HVM) to monitor lithographic fidelity, process stability, and yield-critical phenomena such as defects.

Your assignment

We are offering three internship assignments, each focusing on a key challenge in SEM imaging.